Archive for May 28th, 2025

-Substrate size & load capacity : 20mm*20mm wafer – 1 wafer/batch -Target size : 1inch -Carrousel (1 target holder, Target rotation) – Furnace type 1-zone heater, max.1100? – Rotary pump -Manual angle valve -MFC: O2(100sccm) -Manual control (switch panel)

-Substrate size & load capacity : 200mm*200mm glass – 1 cassette/batch -Chemical bath(SUS316) 2ea -QDR bath(PVDF) 1ea -Sink bath(PP) 1ea – Ultra sonic(40kHz,600W) 1ea – DI generator DI Resistivity : 17 ~ 18.2 ?/? DI Productivity : 500LPH -RO Tank : 650L – PVC out plate -Manual control (switch panel & PLC)

– Substrate size & load capacity : 6inch wafer – 1 wafer/batch -ICP source : RF 2kW -Bias power : RF 600W – Chuck cooling method : Chiller + He cooling (by EPC controller) -TMP + Rotary pump -Throttle valve + APC controller -Baratron gauge + Convectron gauge – MFC: SF6, CF4, CHF3, C4F8, CCl2, […]

-Substrate size & load capacity : 156mm*156mm wafer – 1 wafer/batch 6inch wafer – 1wafer/batch -Molded heater for PECVD, wafer 400? -Water cooling chuck for RIE -RF power 600W 2set – Rotary pump (fomblin type) -Throttle valve + APC controller MFC: Ar(200sccm), O2(100sccm), SF6(100sccm), Cl2(100sccm), 10%SiH4-90%He(50sccm), N2(2slm), NH3(100sccm) PC control RIE &

-Substrate size & load capacity : 4inch wafer – 1 wafer/batch – Source(gas) injection : Showerhead type -Molded heater, Wafer temp. 300?, up/down, rotation -W wire + Temperature controller -Dry pump -Throttle valve + APC controller – Bubbler(heating) 2set -MFC: Vapor MFC for bubbler 1ea, N2(300sccm), Ar(300sccm, 2ea), O2(300sccm) – Loadlock chamber -PC control

-Substrate size & load capacity : -4inch wafer – 3 wafer/batch – Source(gas) injection : Showerhead type -Molded heater, Wafer temp. 400?, up/down -RF power 600W 1ea -Dry pump – Throttle valve + APC controller -MFC: He(1slm), N2(1slm), O2(100sccm), -CF4(500sccm), NH3(100sccm), 10%SIH4- 90%Ar(500sccm) -Loadlock

– Tube#1 – SiC epi. LPCVD (vertical tube) Tube#2 – LTO LPCVD (horizontal tube) -2inch wafer, 2 wafers/batch – Induction heater, max.1900? -High frequency induction oscillator unit (60kW, 30kHz) – Optical pyrometer – Double quartz reactor (water cooling) -Graphite susceptor up/down (motor) – TMP + Dry pump -Throttle valve + APC controller -MFC: Tube#1 – […]

>Tube#1 – Wet oxidation >Tube#2 – Silicon nitride LPCVD – 12inch wafer, 50 wafers/batch (include dummy) – 3-zone heater, max.1200? -Quartz reactor + inner tube -Quartz pedestal & boat up/down (motor) -Dry pump -Throttle valve + APC controller -Heating mantle for H2O (3000cc) -MFC: Tube#1 – O2(10slm),N2(10slm),O2(1slm) -Tube#2 – DCS(1slm), NH3(1slm), -N2(5slm), N2(500sccm) – PC […]