Semicon Front End Manufacturing Tools

The new ACCELERATOR 3500K is the first state-of-the-art high-performance production system for monocrystalline templates. Such templates are a key technology for the efficient mass production of products based on wide-bandgap semiconductors, LEDs, miniLEDs and microLEDs for displays and HEMTs and many other applications therefore benefit from the versatile advantages of the new ACCELERATOR 3500K. • […]

NANO-MASTER state-of-the-art fully automated Sputtering Systems come with water cooled or heated (up to 700 °C) rotating 8” platen and up to three off axis planar magnetrons. The system is pumped with a turbomolecular pump and achieves mid 10-7 Torr base pressure. RF or DC power supplies can be switched to multiple magnetrons by the […]

NANO-MASTER NEE-4000 Electron Beam Evaporation Systems come in a dual chamber configuration consisting of the main chamber where platen is located and a secondary chamber for housing the e-beam source. This configuration with a gate valve between two chambers may be used as a load lock to keep the e-beam source pockets in vacuum while […]

NANO-MASTER NTE-3000 table top and NTE-3500 compact stand alone Thermal Evaporator Systems are manufactured for wide ranges of applications for organic and metal evaporation. They are designed with extreme care to achieve clean, uniform, controllable and reproducible process on a small footprint. They provide at low cost, high quality and advanced capability to end users […]

Maskless lithography enables nanopatterning at will, without the need for slow and expensive photomask. This convenience is especially useful for research and rapid prototyping use. Our system compliments the existing benefits by bringing it to the desktop without any compromise in performance. The Beam Engine focuses a UV laser beam into a diffraction-limited spot and […]

-Substrate size & load capacity : 156mm*156mm wafer – 1 wafer/batch 6inch wafer – 1wafer/batch -Molded heater for PECVD, wafer 400? -Water cooling chuck for RIE -RF power 600W 2set – Rotary pump (fomblin type) -Throttle valve + APC controller MFC: Ar(200sccm), O2(100sccm), SF6(100sccm), Cl2(100sccm), 10%SiH4-90%He(50sccm), N2(2slm), NH3(100sccm) PC control RIE &

– Substrate size & load capacity : 6inch wafer – 1 wafer/batch -ICP source : RF 2kW -Bias power : RF 600W – Chuck cooling method : Chiller + He cooling (by EPC controller) -TMP + Rotary pump -Throttle valve + APC controller -Baratron gauge + Convectron gauge – MFC: SF6, CF4, CHF3, C4F8, CCl2, […]

-Substrate size & load capacity : 200mm*200mm glass – 1 cassette/batch -Chemical bath(SUS316) 2ea -QDR bath(PVDF) 1ea -Sink bath(PP) 1ea – Ultra sonic(40kHz,600W) 1ea – DI generator DI Resistivity : 17 ~ 18.2 ?/? DI Productivity : 500LPH -RO Tank : 650L – PVC out plate -Manual control (switch panel & PLC)

NANO-MASTER has developed the first Table Top Plasma Assisted Metal Organic Chemical Vapor Deposition (PA-MOCVD) System for InGaN and AlGaN deposition processes. The features include five bubblers with individual cooling baths, heated gas lines, 950 °C platen, three gas rings, RF plasma source with shower head gas distribution and N2 flush at the end of […]

-Substrate size & load capacity : 20mm*20mm wafer – 1 wafer/batch -Target size : 1inch -Carrousel (1 target holder, Target rotation) – Furnace type 1-zone heater, max.1100? – Rotary pump -Manual angle valve -MFC: O2(100sccm) -Manual control (switch panel)