Horizontal LPCVD/Furnace System

>Stack#1 – Tube#1 – Thin dry oxide
Tube#2 – Thin oxynitride
Tube#3 – Anneal
> Stack#2 – Tube#1 – Pyrogenic oxide
Tube#2 – LTO
Tube#3 – Silicon nitride
>Stack#3 – Tube#1 – Drive-in
Tube#2 – Intrinsic poly silicon
Tube#3 – N-type doped poly silicon
-6inch wafer, 50 wafers/batch (include dummy)
-3-zone heater, max.1200?
-Alumina twin bar type loader (motor)
-Dry pump / Booster+Rotary pump
-MFC
-PLC & Touch control