Maskless lithography enables nanopatterning at will, without the need for slow and expensive photomask. This convenience is especially useful for research and rapid prototyping use. Our system compliments the existing benefits by bringing it to the desktop without any compromise in performance.
The Beam Engine focuses a UV laser beam into a diffraction-limited spot and scans the spot to expose any arbitrary pattern on a photoresist. To expose large wafers, precision steppers move the wafer and allows multiple exposures to be stitched. The Beam Engine is capable of producing features smaller than (CD) 0.8µm across a 5” wafer.
Compact –
Full-featured maskless lithography, smaller than a desktop computer.
Powerful –
Sub-micron resolution while exposes a writefield in less than two seconds.
Ultrafast Autofocus –
Piezo actuators reach focus in less than a second when combined with our closed-looped focus optics.
No-fuss Multilayer –
Semi-automatic alignment allows multilayer alignment to be completed within minutes.
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